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  • Development of low damage a-Si layers. Work on direct printing technology, metal lines optimization for bifaciality . Fraunhofer ISE will contribute to the development and characterization of passivated contacts within the project, supporting both the realization of the carrier selective layer stack on the wafer itself and the realization of the metallic structure on top of it. For the latter task, plating technology is employed by Fraunhofer ISE.


Fraunhofer ISE is europes largest institute dedicated to solar energy systems research with currently ~1200 employees. The institute is certified according to ISO 9001. Fraunhofer ISE has a high level of experience in the development of novel, highly efficient solar cell structures and currently holds the efficiency world record for crystalline silicon solar cells among research institutes with the TOPCon technology, enabling a 25.1% efficiency due to a passivated contact scheme. 

CONTACT : Dr. Jochen Rentsch

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